Skip to main content

Reflectance -- Measurement

 Subject
Subject Source: Other

Found in 3 Collections and/or Records:

Investigation of reflectance from multi-layered dielectric films, 1970

 Item — Multiple Containers
Identifier: b2089520
Abstract An investigation was conducted to determine the reflectivity of multi-layered dielectric films. The theory was developed for oblique and normal incidence, including vertical and horizontal linear polarization, for single, double and higher order stacks by considering the propagation of a plane, time-harmonic electro-magnetic wave through a stratified medium, including the use of characteristic matrices. Computer programs were written and the theoretical curves obtained for reflectance of...
Dates: 1970

The refractive index of thin silicon dioxide films deposited by using a CO₂ laser, 1973

 Item — Call number MU Thesis Joh
Identifier: b2088650
Abstract A CO₂ laser was employed as the heat source to deposit films of SiO₂. The report discusses the measurement of the refractive indices of the thin transparent films produced. Investigation into the various techniques available for measuring the index of refraction led to the selection of Abeles method for determination of the Brewster angle. A helium-neon laser was used as the source of incident polarized light, while a selenium photocell monitored the reflected...
Dates: 1973

Vacuum deposition of silicon dioxide thin films by a CO₂ laser, 1971

 Item — Call number MU Thesis Lev
Identifier: b2088711
Abstract Most conventional evaporation sources consist of resistance heated metals supporting the evaporant. They have the disadvantage of reacting with the evaporant. This results in the deposition of contaminated films. Evaporation with an electron beam eliminates this problem. However, electron beam evaporation can not be accomplished easily at higher pressures. An investigation was conducted to determine the feasibility of using a CO₂ laser to produce thin films of SiO₂. A helium-neon...
Dates: 1971